Coventry Poly-Wipes

Description

Key Points:-

• Critical-grade cleanroom wipes made from 100% continuous-filament monofilament knitted polyester (single-ply or 2-ply).

• Designed for Class 10 to Class 100 (ISO Class 4 to 5) cleanroom environments.

• Features laser-sealed or ultrasonic-sealed edges to prevent fiber shedding during heavy scrubbing over abrasive hardware.

• Laundered in ultra-pure deionized water and double-bagged to maintain low extractable ions (sodium, potassium, chloride) and minimal non-volatile residue (NVR).

• Highly resistant to strong acids, alkalis, and organic solvents.

• Suitable for cleaning semiconductor wafers, precision optics, optical fiber splices, and medical device assemblies.

JEC Technology provides Coventry Poly-Wipes to high-tech manufacturing industries across Singapore, delivering critical-grade cleanliness for Class 10 to Class 100 (ISO Class 4 to 5) cleanrooms. Constructed from 100% continuous-filament monofilament polyester, these cleanroom-laundered wipes offer the highest level of particle containment and physical strength.

Featuring laser-sealed or ultrasonic-sealed edges, Poly-Wipes eliminate loose edge fibers and linting under heavy mechanical wiping action. They are specifically designed for cleaning sensitive optics, semiconductor wafers, optical fiber splices, and precision medical device assemblies.

Laundered in ultra-pure deionized water and packaged in double-bagged cleanroom enclosures, Coventry Poly-Wipes ensure minimal non-volatile residue (NVR) and ion counts, providing absolute confidence in critical process cleaning.

Features

Constructed with 100% continuous-filament 2-ply or single-ply knitted polyester, Poly-Wipes generate virtually zero airborne particles or loose fibers, meeting rigid ISO Class 4 cleanroom requirements.

Precision-sealed edges lock in edge fibers, enabling heavy scrubbing over abrasive solder joints or metallic hardware without fiber release or shedding. The material exhibits high resistance to strong acids, alkalis, and organic solvents.

Extremely low levels of extractable ions (sodium, potassium, chloride) and NVR prevent chemical contamination on critical optical lenses, laser optics, and silicon wafer surfaces during wet cleaning operations.